Continuum model of thin-film deposition and growth

Continuum model of thin-film deposition and growth.

Continuum model description of thin film growth morphology

We examine the applicability of the continuum model to describe the surface morphology of a hetero-growth system: compositionally-graded, relaxed GeSi films on (001) Si substrates. Surface roughness versus lateral dimension was analyzed for samples what were grown under different conditions. We find that all samples belong to the same growth class, in which the surface roughness scales linearly...

Amorphous thin film growth: minimal deposition equation

A nonlinear stochastic growth equation is derived from (i) the symmetry principles relevant for the growth of vapor deposited amorphous films, (ii) no excess velocity, and (iii) a low-order expansion in the gradients of the surface profile. A growth instability in the equation is attributed to the deflection of the initially perpendicular incident particles due to attractive forces between the ...

Growth, Characterization of Cu Nanoparticles Thin Film by Nd: YAG Laser Pulses Deposition

We report the growth and characterization of Cu nanoparticles thin film of on glass substrate by pulse laser deposition method. The Cu thin film prepared with different energy 50, 60, 70, and 80 mJ. The energy effect on the morphological, structural and optical properties were studied by AFM, XRD and UV-Visible spectrophotometer. Surface topography studied by atomic force microscopy revealed na...

The control of thin film deposition and recent developments in oxide film growth

This review describes just some of the recent developments in thin film deposition technology which have led to improved understanding and control of film growth. The first part is concerned with the development of sputter deposition methods offering control of the energy of depositing species, and the use of structure zone models, which describe the link between film deposition parameters and ...